Our reactive ion applicator MA1250D-114BB, also called "DeCap Compact", is basically the downsized table-top version of our reactive ion applicator MA3000D-151BB. While it only offers a maximum of 1000 W of microwave power for the remote plasma source, compared to the 3000 W of the MA3000D-151BB, its smaller working area means that the high etching rate of 0.2 mm per hour can almost be maintained. A further important advantage of the MA1250D-114BB is the, compared to the MA3000D-151BB, considerably lower investment. Our "DeCap Compact" is therefore the ideal solution for smaller fabs, R&D labs, university institutes or service providers which do not need to run such an applicator 24/7 or can live with the somewhat reduced working area and throughput.